BREAKINGOpenAI closes $40B round at $340B valuation — largest private tech raise ever·MODELSAnthropic ships Claude Opus 4 with extended thinking and agentic capabilities·FUNDINGxAI raises $6B Series C led by Andreessen Horowitz for Grok infrastructure·REGULATIONEU AI Act enters full enforcement — high-risk systems must comply now·AGENTSGoogle DeepMind open-sources Gemini Agent Framework for autonomous task completion·RESEARCHStanford HAI: Enterprise AI adoption hits 78% globally, GenAI in production at 45%·WARNINGUS Senate passes AI Transparency Act — content labeling required at scale·PRODUCTMeta releases Llama 4 Maverick open-weight model rivaling proprietary alternatives·MODELSDeepSeek V3 scores within 2% of GPT-4o on MMLU at 1/10th the inference cost·FUNDINGMistral AI raises €600M Series B at €6B valuation for European AI sovereignty·BREAKINGOpenAI closes $40B round at $340B valuation — largest private tech raise ever·MODELSAnthropic ships Claude Opus 4 with extended thinking and agentic capabilities·FUNDINGxAI raises $6B Series C led by Andreessen Horowitz for Grok infrastructure·REGULATIONEU AI Act enters full enforcement — high-risk systems must comply now·AGENTSGoogle DeepMind open-sources Gemini Agent Framework for autonomous task completion·RESEARCHStanford HAI: Enterprise AI adoption hits 78% globally, GenAI in production at 45%·WARNINGUS Senate passes AI Transparency Act — content labeling required at scale·PRODUCTMeta releases Llama 4 Maverick open-weight model rivaling proprietary alternatives·MODELSDeepSeek V3 scores within 2% of GPT-4o on MMLU at 1/10th the inference cost·FUNDINGMistral AI raises €600M Series B at €6B valuation for European AI sovereignty·

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announcement

MorphOPC: Advancing Mask Optimization with Multi-scale Hierarchical Morphological Learning

May 14, 2026Scale AI

Event Summary

arXiv:2605.12528v1 Announce Type: new Abstract: As feature sizes shrink to the nanometer scale, accurately transferring circuit patterns from photomasks to silicon wafers becomes increasingly challenging. Optical proximity correction (OPC) is widely used to ensure pattern fidelity and manufacturabil

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